Wang, Lei#, Asempah, Isaac, Dong, Song-Tao, Yin, Pian-Pian, Jin, Lei#. Quantitative studies of electric field intensity on atom diffusion of Cu/Ta/Si stacks during annealing. Applied Surface Science, 2017 399, 215-219
Wang, Lei#, Asempah, Isaac, Dong, Song-Tao, Yin, Pian-Pian, Jin, Lei#. Quantitative studies of electric field intensity on atom diffusion of Cu/Ta/Si stacks during annealing. Applied Surface Science, 2017 399, 215-219