Wang, Lei#, Asempah, Isaac, Dong, Song-Tao, Yin, Pian-Pian, Jin, Lei#. Quantitative studies of electric field intensity on atom diffusion of Cu/Ta/Si stacks during annealing. Applied Surface Science, 2017 399, 215-219

发布者:汪蕾发布时间:2022-05-24浏览次数:173

Wang, Lei#, Asempah, Isaac, Dong, Song-Tao, Yin, Pian-Pian, Jin, Lei#. Quantitative studies of electric field intensity on atom diffusion of Cu/Ta/Si stacks during annealing. Applied Surface Science, 2017 399, 215-219


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