头像
Wang, Lei#, Xu Jun Hua, Yu Li Hua, Effect of electric field intensity on atom diffusion in Cu/Ta/Si stacks. In: TMS2015 Supplemental Proceedings, The Minerals, Metals & Materials Society, Wiley, Hoboken, Orlando, USA, 2015, 575
Email:
Office:
Address:
PostCode:
Fax:

您是第124Access

  • Wang, Lei#, Xu Jun Hua, Yu Li Hua, Effect of electric field intensity on atom diffusion in Cu/Ta/Si stacks. In: TMS2015 Supplemental Proceedings, The Minerals, Metals & Materials Society, Wiley, Hoboken , Orlando , USA , 2015, 575


Baidu
map